H. Jörg Osten
Leibniz University Hannover, Germany
Biography
H Jörg Osten has studied Physics in Poland. First he was working at the Institute for Physical Chemistry in Berlin in the field of Radio-Frequency Spectroscopy. In 1988, he joined the Institute of Semiconductor Physics (IHP) in Frankfurt, Germany. In 2002, he became the Director of the Institute Electronic Materials and Devices at the Leibniz University of Hannover, Germany, where he also holds a Chair for Electronic Materials and Technology. He has published more than 270 papers and gave more than 80 invited and 200 contributed talks at international conferences.
Abstract
Abstract : Epitaxial oxides on silicon for nanoelectronic applications